07959769 is referenced by 14 patents and cites 879 patents.

In accordance with the present invention, deposition of LiCoO2 layers in a pulsed-dc physical vapor deposition process is presented. Such a deposition can provide a low-temperature, high deposition rate deposition of a crystalline layer of LiCoO2 with a desired (101) or (003) orientation. Some embodiments of the deposition addresses the need for high rate deposition of LiCoO2 films, which can be utilized as the cathode layer in a solid state rechargeable Li battery. Embodiments of the process according to the present invention can eliminate the high temperature (>700° C.) anneal step that is conventionally needed to crystallize the LiCoO2 layer. Some embodiments of the process can improve a battery utilizing the LiCoO2 layer by utilizing a rapid thermal anneal process with short ramp rates.

Title
Deposition of LiCoO
Application Number
11/557383
Publication Number
7959769 (B2)
Application Date
November 7, 2006
Publication Date
June 14, 2011
Inventor
Bernd J Neudecker
Littleton
CO, US
Richard E Demaray
Portola Valley
CA, US
Hongmei Zhang
San Jose
CA, US
Agent
Jeff E Schwartz
Dewey & LeBoeuf
Assignee
Infinite Power Solutions
CO, US
IPC
C23C 14/34
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