07903232 is referenced by 6 patents and cites 10 patents.

An immersion lithographic exposure apparatus in which the pH of the top coat of the immersion liquid is chosen so as to maximize the relative speed at which a part of the liquid supply system and the substrate W can be moved relative to each other without collapse of a meniscus extending between those components.

Title
Lithographic apparatus and device manufacturing method
Application Number
11/402258
Publication Number
7903232 (B2)
Application Date
April 12, 2006
Publication Date
March 8, 2011
Inventor
Martin Anton Bos
Wageningen
NL
Michel Riepen
Bergschenhoek
NL
Martinus Hendrikus Antonius Leenders
Rotterdam
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03B 27/42
G03B 27/52
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