07897491 is referenced by 2 patents and cites 147 patents.

Methods and apparatuses for selective epitaxial formation of films separately inject reactive species into a CVD chamber. The methods are particularly useful for selective deposition using volatile combinations of precursors and etchants. Formation processes include simultaneous supply of precursors and etchants for selective deposition, or sequential supply for cyclical blanket deposition and selective etching. In either case, precursors and etchants are provided along separate flow paths that intersect in the relatively open reaction space, rather than in more confined upstream locations.

Title
Separate injection of reactive species in selective formation of films
Application Number
12/639388
Publication Number
7897491 (B2)
Application Date
December 16, 2009
Publication Date
March 1, 2011
Inventor
Matthias Bauer
Phoenix
AZ, US
Agent
Knobbe Martens Olson & Bear
Assignee
ASM America
AZ, US
IPC
H01L 21/20
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