Method for forming anti-reflective coating United States Patent 07833696

07833696 is referenced by 2 patents and cites 77 patents.

Silsesquioxane resins useful in forming the antireflective coating having the formula (PhSiO(3-x)/2(OH)x)mHSiO(3-x)/2(OH)x)n(MeSiO(3-x)/2(OH)x)p(RSiO(3-x)/2(OH)x)q where Ph is a phenyl group, Me is a methyl group, R is selected from ester groups and polyether groups, x has a value of 0, 1 or 2; m has a value of 0.05 to 0.95, n has a value of 0.05 to 0.95, p has a value of 0.05 to 0.95, q has a value of 0.01 to 0.30 and m+n+p+q≈1.

Title
Method for forming anti-reflective coating
Application Number
11/666823
Publication Number
7833696 (B2)
Application Date
September 29, 2005
Publication Date
November 16, 2010
Inventor
Craig Rollin Yeakle
Midland
MI, US
Eric Scott Moyer
Midland
MI, US
Peng Fei Fu
Midland
MI, US
Agent
Sharon K Brady
Assignee
Dow Corning Corporation
MI, US
IPC
G03F 7/075
View Original Source

Citations: 2

  1. Michael L Bradford, Eric Scott Moyer, Sheng Wang, Craig Rollin Yeakle: Silsesquioxane resins. Dow Corning Corporation, Erika Takeuchi, Sharon K Brady, November 6, 2012: US08304161 (7 worldwide citation)
  2. Shahrokh Motallebi, SangHak Lim: Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same. Cheil, Lee & Morse P C, September 27, 2011: US08026035 (1 worldwide citation)

References: 77 (view full list)

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