07833350 cites 10 patents.

An apparatus for treating a substrate includes a stage adapted to receive the substrate; a gas shield facing the substrate and having a retention space, the gas shield including: a top plate; a bottom plate facing the substrate and having pump holes around the retention space; and a middle plate between the top and bottom plates and having a first gas path communicating with the retention space and a second gas path communicating with the pump holes; an energy source facing the top plate such that light emitted therefrom irradiates a part of the substrate through the retention space; a reaction gas supplier connected to the first gas path; and a pressure adjusting device connected to the second gas path.

Title
Apparatus for treating thin film and method of treating thin film
Application Number
11/235014
Publication Number
7833350 (B2)
Application Date
September 22, 2005
Publication Date
November 16, 2010
Inventor
Sang Hyuck Park
Osan-si
KR
Je Sup Lee
Gumi-si
KR
Jong Chul Lee
Gyeongsan-si
KR
Agent
Brinks Hofer Gilson & Lione
Assignee
LG Display
KR
IPC
H01L 21/306
C23C 16/48
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