07804575 is referenced by 10 patents and cites 109 patents.

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.

Title
Lithographic apparatus and device manufacturing method having liquid evaporation control
Application Number
11/205325
Publication Number
7804575 (B2)
Application Date
August 17, 2005
Publication Date
September 28, 2010
Inventor
Michel Riepen
Bergschenhoek
NL
Franciscus Johannes Joseph Janssen
Eindhoven
NL
Bart Leonard Peter Schoondermark
Vught
NL
Martin Frans Pierre Smeets
Veldhoven
NL
Richard Moerman
Son
NL
Stoyan Nihtianov
Eindhoven
NL
Herman Boom
Eindhoven
NL
Boris Menchtchikov
Eindhoven
NL
Koen Goorman
Eindhoven
NL
Frederik Eduard De Jong
Eindhoven
NL
Jacobus Johannus Leonardus Hendricus Verspay
Thorn
NL
Martinus Cornelis Maria Verhagen
Valkenswaard
NL
Patricius Aloysius Jacobus Tinnemans
Hapert
NL
Marco Koert Stavenga
Eindhoven
NL
Maria Elisabeth Reuhman Huisken
Waalre
NL
Johannes Anna Quaedackers
Nijmegen
NL
Joost Jeroen Ottens
Veldhoven
NL
Antonius Johannus Van Der Net
Tilburg
NL
Marcel Johannus Elisabeth Hubertus Muitjens
Nuth
NL
Christianus Gerardus Maria De Mol
Son en Breugel
NL
Jeroen Johannes Sophia Maria Mertens
Duizel
NL
Aschwin Lodewijk Hendricus Johannes Vermeer
Roosendaal
NL
Erik Roelof Loopstra
Heeze
NL
Nicolaas Ten Kate
Almkerk
NL
Johannes Henricus Wilhelmus Jacobs
Eindhoven
NL
Theodorus Petrus Maria Cadee
Vlierden
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03B 27/52
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