07749326 is referenced by 211 patents and cites 2 patents.

Provided is a chemical vapor deposition apparatus including a reaction chamber; a susceptor that is provided in the reaction chamber and has a plurality of wafers mounted thereon; a rotation driving unit that rotates the susceptor; a gas inlet that is provided in the reaction chamber and introduces reaction gas into the reaction chamber from the outside of the reaction chamber; a gas outlet that is provided in the reaction chamber and discharges the reaction gas, of which the reaction is finished, from the inside of the reaction chamber along the rotation-axis direction of the susceptor; and a variable gas-flow adjusting unit that is provided between the gas inlet and the gas outlet and is formed by superimposing a plurality of gas jetting plates having a plurality of holes.

Title
Chemical vapor deposition apparatus
Application Number
12/177037
Publication Number
7749326 (B2)
Application Date
July 21, 2008
Publication Date
July 6, 2010
Inventor
Joong El Ghim
Gyeonggi-Do
KR
Jong Pa Hong
Gyeonggi-Do
KR
Chang Sung Sean Kim
Gyeonggi-Do
KR
Agent
Lowe Hauptman Ham & Berner
Assignee
Samsung LED
KR
IPC
C23C 16/22
C23C 16/06
C23F 1/00
H01L 21/306
C23C 16/458
C23C 16/455
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