07671963 is referenced by 25 patents and cites 171 patents.

An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

Title
Lithographic apparatus and device manufacturing method
Application Number
11/132415
Publication Number
7671963 (B2)
Application Date
May 19, 2005
Publication Date
March 2, 2010
Inventor
Minne Cuperus
Veldhoven
NL
Koen Jacobus Johannes M Zaal
Eindhoven
NL
Jeroen Johannes Sophia Maria Mertens
Duizel
NL
Christiaan Alexander Hoogendam
Veldhoven
NL
Henrikus Herman Cox
Eindhoven
NL
Bob Streefkerk
Tilburg
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03B 27/32
G03B 27/42
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