07639343 is referenced by 109 patents and cites 117 patents.

An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. In addition, a supply mechanism supplies liquid to locally fill a space between the projection optical system and the substrate on the substrate stage with the liquid, and a recovery mechanism recovers the liquid. A plate is provided in at least a part of the periphery of a mounted area of the substrate on the substrate stage. The plate has a surface arranged at substantially the same height as a surface of the substrate mounted on the substrate stage.

Title
Exposure apparatus and device manufacturing method
Application Number
11/655083
Publication Number
7639343 (B2)
Application Date
January 19, 2007
Publication Date
December 29, 2009
Inventor
Shigeru Hirukawa
Tokyo
JP
Agent
Oliff & Berridge
Assignee
Nikon Corporation
JP
IPC
G03B 27/32
G03B 27/58
G03B 27/52
G03B 27/42
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