07618751 is referenced by 16 patents and cites 43 patents.

The present invention relates to Optical Maskless Lithography (OML). In particular, it relates to providing OML with a recognizable relationship to mask and phase-shift mask techniques.

Title
RET for optical maskless lithography
Application Number
11/66828
Publication Number
7618751 (B2)
Application Date
February 25, 2005
Publication Date
November 17, 2009
Inventor
Hans Martinsson
Goteburg
SE
Torbjorn Sandstrom
Pixbo
SE
Agent
Haynes Beffel & Wolfeld
Ernest J Beffel Jr
Assignee
Micronic Laser Systems
SE
IPC
G02B 26/12
B41J 2/47
View Original Source