07589821 is referenced by 108 patents and cites 117 patents.

A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.

Title
Exposure apparatus and device manufacturing method
Application Number
11/878076
Publication Number
7589821 (B2)
Application Date
July 20, 2007
Publication Date
September 15, 2009
Inventor
Shigeru Hirukawa
Kita-ku
JP
Agent
Oliff & Berridge
Assignee
Nikon Corporation
JP
IPC
G03B 27/32
G03B 27/58
G03B 27/52
G03B 27/42
View Original Source