07573052 is referenced by 16 patents and cites 30 patents.

A pattern image generation device generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is photoelectrically detected by a detection system. Then, a correction device corrects design data that should be input to the pattern image generation device based on the detection results. Accordingly, a pattern image is generated on an object by the pattern image generation device corresponding to the input of the design data after the correction, and because the object is exposed using the pattern image, a desired pattern is formed on the object with good precision.

Title
Exposure apparatus, exposure method, and device manufacturing method
Application Number
12/120838
Publication Number
7573052 (B2)
Application Date
May 15, 2008
Publication Date
August 11, 2009
Inventor
Tohru Kiuchi
Tokyo
JP
Hideya Inoue
Kanagawa
JP
Agent
Miles & Stockbridge P C
Assignee
Nikon Corporation
JP
IPC
G03B 27/34
G01N 21/33
H01J 37/20
H01J 37/304
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