07545511 is referenced by 4 patents and cites 52 patents.

Disclosed herein is an interferometry device and associated method and computerized media for testing optical components including those with high aberrations, comprising: situating an optical component under test between a source of a spherical test wavefront and a spherical reference mirror; propagating a spherical test wavefront, whereby an axial line is defined by a direction of propagation of said wavefront; deriving a substantially complete first-tilt-alignment wavefront metrology of the optical component under test from a plurality of first-tilt-alignment interferograms obtained with the optical component under test held fixed at a first predetermined tilt angle relative to a direction of propagation of said wavefront; and varying an axial displacement between the optical component under test and the spherical reference mirror to obtain each first-tilt-alignment interferogram. By varying the tilt angle, one can also derive a substantially complete surface metrology of the optical component under test.

Title
Transmitted wavefront metrology of optics with high aberrations
Application Number
11/622152
Publication Number
7545511 (B1)
Application Date
January 11, 2007
Publication Date
June 9, 2009
Inventor
Mikhail Gutin
Albany
NY, US
Agent
Jay R Yablon
Assignee
Applied Science Innovations
NY, US
IPC
G01B 11/02
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