07507848 is referenced by 9 patents and cites 43 patents.

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit hafnium silicate on surfaces heated to 300° C. The product film has a very uniform stoichiometry throughout the reactor. Similarly, vapors of diisopropylphosphate react with vapors of lithium bis(ethyldimethylsilyl)amide to deposit lithium phosphate films on substrates heated to 250° C. Supplying the vapors in alternating pulses produces these same compositions with a very uniform distribution of thickness and excellent step coverage.

Title
Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
Application Number
11/199032
Publication Number
7507848 (B2)
Application Date
August 8, 2005
Publication Date
March 24, 2009
Inventor
Seigi Suh
Cary
NC, US
Dennis Hausmann
Los Gatos
CA, US
Jill S Becker
Cambridge
MA, US
Roy G Gordon
Cambridge
MA, US
Agent
Wilmer Cutler Pickering Hale & Dorr
Assignee
President and Fellows of Harvard College
MA, US
IPC
C23C 16/00
C07F 11/00
C07F 7/00
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