07497959 is referenced by 4 patents and cites 18 patents.

Increased protection of areas of a chip are provided by both a mask structure of increased robustness in regard to semiconductor manufacturing processes or which can be removed with increased selectivity and controllability in regard to underlying materials, or both. Mask structures are provided which exhibit an interface of a chemical reaction, grain or material type which can be exploited to enhance either or both types of protection. Structures of such masks include TERA material which can be converted or hydrated and selectively etched using a mixture of hydrogen fluoride and a hygroscopic acid or organic solvent, and two layer structures of similar or dissimilar materials.

Title
Methods and structures for protecting one area while processing another area on a chip
Application Number
10/709514
Publication Number
7497959 (B2)
Application Date
May 11, 2004
Publication Date
March 3, 2009
Inventor
Harald Okorn Schmidt
Klagenfurt
AT
Arpan P Mahorowala
Bronxville
NY, US
Katherina Babich
Chappaqua
NY, US
Timothy Dalton
Ridgefield
NY, US
Dirk Pfeiffer
Dobbs Ferry
NY, US
Carl J Radens
Lagrangeville
NY, US
Ramachandra Divakaruni
Ossining
NY, US
Kangguo Cheng
Beacon
NY, US
Kenneth T Settlemyer Jr
Poughquag
NY, US
Deok kee Kim
Wappingers Falls
NY, US
Agent
Joseph P Abate
Whitman Curtis Christofferson & Cook PC
Assignee
International Business Machines Corporation
NY, US
IPC
H01L 49/00
H01L 21/31
H01B 3/00
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