07468779 is referenced by 7 patents and cites 109 patents.

A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.

Title
Lithographic apparatus and device manufacturing method
Application Number
11/167563
Publication Number
7468779 (B2)
Application Date
June 28, 2005
Publication Date
December 23, 2008
Inventor
Michel Riepen
Bergschenhoek
NL
Jan Gerard Cornelis Van Der Toorn
Eindhoven
NL
Bob Streefkerk
Tilburg
NL
Jeroen Johannes Sophia Maria Mertens
Duizel
NL
Martinus Hendrikus Antonius Leenders
Rotterdam
NL
Hans Jansen
Eindhoven
NL
Christiaan Alexander Hoogendam
Veldhoven
NL
Sjoerd Nicolaas Lambertus Donders
s-Hertogenbosch
NL
Roelof Frederik De Graaf
Veldhoven
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03C 5/00
G03B 27/32
G03B 27/52
G03B 27/42
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