07456929 is referenced by 56 patents and cites 61 patents.

An exposure apparatus which prevents damages due to leaked out liquid from expanding and can maintain exposure accuracy and measuring accuracy. The exposure apparatus includes first and second stages (ST1, ST2) which can independently move within an XY-plane on an image plane side of a projection optical system (PL); a drive mechanism (SD) which moves the first stage and the second stage together with the stage being close to or in contact with each other; a liquid immersion mechanism (1) which forms a liquid immersion area on an upper plane of at least one of the stages of the first stage and the second stage; and a detecting device (60) which detects liquid leaked out from between the first stage and the second stage.

Title
Exposure apparatus and device manufacturing method
Application Number
11/665273
Publication Number
7456929 (B2)
Application Date
October 12, 2005
Publication Date
November 25, 2008
Inventor
Makoto Shibuta
Kumagaya
JP
Agent
Oliff & Berridge
Assignee
Nikon Corporation
JP
IPC
G03B 27/52
G03B 27/42
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