07433016 is referenced by 11 patents and cites 113 patents.

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

Title
Lithographic apparatus and device manufacturing method
Application Number
11/120176
Publication Number
7433016 (B2)
Application Date
May 3, 2005
Publication Date
October 7, 2008
Inventor
Michel Riepen
Bergschenhoek
NL
Jeroen Johannes Sophia Maria Mertens
Duizel
NL
Martinus Hendrikus Antonius Leenders
Rotterdam
NL
Christiaan Alexander Hoogendam
Veldhoven
NL
Roelof Frederik De Graaf
Veldhoven
NL
Sjoerd Nicolaas Lambertus Donders
′s-Hertogenbosch
NL
Bob Streefkerk
Tilburg
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03B 27/52
G03B 27/42
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