07411657 is referenced by 18 patents and cites 111 patents.

A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.

Title
Lithographic apparatus and device manufacturing method
Application Number
10/990323
Publication Number
7411657 (B2)
Application Date
November 17, 2004
Publication Date
August 12, 2008
Inventor
Koen Jacobus Johannes Maria Zaal
Eindoven
NL
Martinus Hendrikus Antonius Leenders
Rotterdam
NL
Noud Jan Gilissen
Eindhoven
NL
Joost Jeroen Ottens
Veldhoven
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03B 27/42
G03B 27/58
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