07405414 is referenced by 14 patents and cites 25 patents.

The present invention relates to a method for creating a pattern on a workpiece sensitive to electromagnetic radiation. Electromagnetic radiation is emitted onto a computer controlled reticle having a multitude of modulating elements (pixels). The pixels are arranged in said computer controlled reticle according to a digital description. An image of said computer controlled reticle is created on said workpiece, wherein said pixels in said computer controlled reticle are arranged in alternate states along at least a part of one feature edge in order to create a smaller address grid. The invention also relates to an apparatus for creating a pattern on a workpiece. The invention also relates to a semiconducting wafer and a mask.

Title
Method and apparatus for patterning a workpiece
Application Number
10/498713
Publication Number
7405414 (B2)
Application Date
December 11, 2002
Publication Date
July 29, 2008
Inventor
Torbjorn Sandstrom
Pixbo
SE
Agent
Haynes Beffel & Wolfeld
Ernest J Beffel Jr
Assignee
Micronic Laser Systems
SE
IPC
G21K 5/10
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