07394521 is referenced by 112 patents and cites 169 patents.

A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Title
Lithographic apparatus and device manufacturing method
Application Number
10/743271
Publication Number
7394521 (B2)
Application Date
December 23, 2003
Publication Date
July 1, 2008
Inventor
Aleksey Kolesnychenko
Nijmegen
NL
Helmar Van Santen
Amsterdam
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03B 27/52
G03B 27/42
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