07388649 is referenced by 69 patents and cites 174 patents.

There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

Title
Exposure apparatus and method for producing device
Application Number
11/284187
Publication Number
7388649 (B2)
Application Date
November 22, 2005
Publication Date
June 17, 2008
Inventor
Soichi Owa
Kumagaya
JP
Katsushi Nakano
Kumagaya
JP
Kenichi Shiraishi
Saitama
JP
Yasushi Mizuno
Saitama
JP
Akikazu Tanimoto
Yokohama
JP
Naoyuki Kobayashi
Fukaya
JP
Agent
Oliff & Berridge
Assignee
Nikon Corporation
JP
IPC
G03B 27/52
G03B 27/42
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