07353492 is referenced by 170 patents and cites 8 patents.

A method of forming integrated circuit (IC) chip shapes and a method and computer program product for converting an IC design to a mask, e.g., for standard cell design. Individual book/macro physical designs (layouts) are proximity corrected before unnesting and an outer proximity range is determined for each proximity corrected physical design. Shapes with a unique design (e.g., in boundary cells and unique instances of books) are tagged and the design is unnested. Only the unique shapes are proximity corrected in the unnested design, which may be used to make a mask for fabricating IC chips/wafers.

Title
Method of IC fabrication, IC mask fabrication and program product therefor
Application Number
11/43482
Publication Number
7353492 (B2)
Application Date
January 26, 2005
Publication Date
April 1, 2008
Inventor
Mark A Lavin
Katonah
NY, US
Fook Luen Heng
Yorktown Heights
NY, US
Puneet Gupta
Sunnyvale
CA, US
Agent
Brian P Verminski Esq
Louis J Percello Esq
Law Office of Charles W Peterson Jr
Assignee
International Business Machines Corporation
NY, US
IPC
G06F 17/50
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