07352434 is referenced by 114 patents and cites 187 patents.

In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

Title
Lithographic apparatus and device manufacturing method
Application Number
10/844575
Publication Number
7352434 (B2)
Application Date
May 13, 2004
Publication Date
April 1, 2008
Inventor
Martijn Houkes
Sittard
NL
Jan Gerard Cornelis Van Der Toorn
Eindhoven
NL
Alexander Straaijer
Eindhoven
NL
Bernardus Antonius Slaghekke
Veldhoven
NL
Klaus Simon
Eindhoven
NL
Gerardus Petrus Matthijs Van Nunen
Berghem
NL
Johannes Catharinus Hubertus Mulkens
Waalre
NL
Frits Van Der Meulen
Breda
NL
Jeroen Johannes Sophia Maria Mertens
Duizel
NL
Erik Roelof Loopstra
Heeze
NL
Joeri Lof
Eindhoven
NL
Christiaan Alexander Hoogendam
Veldhoven
NL
Sjoerd Nicolaas Lambertus Donders
's-Hertogenbosch
NL
Antonius Theodorus Anna Maria Derksen
Eindhoven
NL
Henrikus Herman Marie Cox
Eindhoven
NL
Johannes Jacobus Matheus Baselmans
Oirschot
NL
Levinus Pieter Bakker
Helmond
NL
Bob Streefkerk
Tilburg
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03B 27/52
G03B 27/42
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