07327435 is referenced by 56 patents and cites 168 patents.

An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.

Title
Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
Application Number
11/259061
Publication Number
7327435 (B2)
Application Date
October 27, 2005
Publication Date
February 5, 2008
Inventor
Michael Binnard
Belmont
CA, US
Agent
Oliff & Berridge
Assignee
Nikon Corporation
JP
IPC
G03B 27/32
G03B 27/43
G03B 27/52
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