07292313 is referenced by 78 patents and cites 175 patents.

Systems and methods control the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space between a lens and a substrate during the immersion lithography process. Fluid is supplied to the space and is recovered from the space through a porous member in fluidic communication with the space. Maintaining the pressure in the porous member under the bubble point of the porous member can eliminate noise created by mixing air with the fluid during fluid recovery. The method can include drawing the fluid from the space via a recovery flow line through a porous member, and maintaining a pressure of the fluid in the porous member below a bubble point of the porous member during drawing of the fluid from the space.

Title
Apparatus and method for providing fluid for immersion lithography
Application Number
11/362833
Publication Number
7292313 (B2)
Application Date
February 28, 2006
Publication Date
November 6, 2007
Inventor
Leonard Wai Fung Kho
San Francisco
CA, US
Alex Ka Tim Poon
San Ramon
CA, US
Agent
Oliff & Berridge
Assignee
Nikon Corporation
JP
IPC
G03B 27/32
G03B 27/52
G03B 27/42
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