07289212 is referenced by 91 patents and cites 48 patents.

The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitative or optical height sensors.

Title
Lithographic apparatus, device manufacturing method and device manufacturing thereby
Application Number
10/825215
Publication Number
7289212 (B2)
Application Date
April 16, 2004
Publication Date
October 30, 2007
Inventor
Yim Bun Patrick Kwan
Aalen
DE
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03B 27/32
G03B 27/42
G01B 11/14
G01B 11/00
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