07198973 is referenced by 116 patents and cites 390 patents.

A method for fabricating an interference display unit is provided. A first plate and a sacrificial layer are formed in order on a substrate and at least two openings are formed in the first plate and the sacrificial layer. A photoresist layer is spin-coated on the sacrificial layer and fills the openings. A photolithographic process patterns the photoresist layer to define a support with an arm. A second plate is formed on the sacrificial layer and posts. The arm's stress is released through a thermal process. The position of the arm is shifted and the distance between the first plate and the second plate is therefore defined. Finally, The sacrificial layer is removed.

Title
Method for fabricating an interference display unit
Application Number
10/705824
Publication Number
7198973 (B2)
Application Date
November 13, 2003
Publication Date
April 3, 2007
Inventor
Hsiung Kuang Tsai
Taipei
TW
Wen Jian Lin
Hsinchu
TW
Agent
Knobbe Martens Olson & Bear
Assignee
Qualcomm MEMS Technologies
CA, US
IPC
H01L 21/00
View Original Source