07196342 is referenced by 151 patents and cites 161 patents.

Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV meteorology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

Title
Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
Application Number
11/174442
Publication Number
7196342 (B2)
Application Date
June 29, 2005
Publication Date
March 27, 2007
Inventor
William F Marx
San Diego
CA, US
Alexander I Ershov
San Diego
CA, US
Agent
William C Cray
Matthew Hillman
Assignee
Cymer
CA, US
IPC
C25F 1/00
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