07193232 is referenced by 140 patents and cites 86 patents.

A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

Title
Lithographic apparatus and device manufacturing method with substrate measurement not through liquid
Application Number
10/705816
Publication Number
7193232 (B2)
Application Date
November 12, 2003
Publication Date
March 20, 2007
Inventor
Erik Roelof Loopstra
Heeze
NL
Hendricus Johannes Maria Meijer
Veldhoven
NL
Johannes Catharinus Hubertus Mulkens
Maastricht
NL
Theodorus Marinus Modderman
Nuenen
NL
Klaus Simon
Eindhoven
NL
Roelof Aeilko Siebrand Ritsema
Eindhoven
NL
Joannes Theodoor De Smit
Eindhoven
NL
Joeri Lof
Eindhoven
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03B 27/42
G01N 21/86
View Original Source