07172849 is referenced by 4 patents and cites 2 patents.

Antireflective hardmask compositions and techniques for the use of antireflective hardmask compositions for processing of semiconductor devices are provided. In one aspect of the invention, an antireflective hardmask layer for lithography is provided. The antireflective hardmask layer comprises a carbosilane polymer backbone comprising at least one chromophore moiety and at least one transparent moiety; and a crosslinking component. In another aspect of the invention, a method for processing a semiconductor device is provided. The method comprises the steps of: providing a material layer on a substrate; forming an antireflective hardmask layer over the material layer. The antireflective hardmask layer comprises a carbosilane polymer backbone comprising at least one chromophore moiety and at least one transparent moiety; and a crosslinking component.

Title
Antireflective hardmask and uses thereof
Application Number
10/646307
Publication Number
7172849 (B2)
Application Date
August 22, 2003
Publication Date
February 6, 2007
Inventor
Karen Temple
Croton-on-Hudson
NY, US
Dirk Pfeiffer
Dobbs Ferry
NY, US
David R Medeiros
Ossining
NY, US
Arpan P Mahorowala
Bronxville
NY, US
Elbert Huang
Tarrytown
NY, US
Katherina Babich
Chappaqua
NY, US
Agent
Daniel P Morris Esq
Ryan Mason & Lewis
Assignee
International Business Machines Corporation
NY, US
IPC
G03F 7/09
G03F 7/038
G03C 1/835
G03C 1/825
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