07161659 is referenced by 157 patents and cites 7 patents.

The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.

Title
Dual stage lithographic apparatus and device manufacturing method
Application Number
11/135655
Publication Number
7161659 (B2)
Application Date
May 24, 2005
Publication Date
January 9, 2007
Inventor
Erik Roelof Loopstra
Heeze
NL
Jozef Petrus Henricus Benschop
Veldhoven
NL
Marinus Aart Van Den Brink
Moergestel
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03B 27/58
G03B 27/52
G03B 27/42
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