07075616 is referenced by 230 patents and cites 74 patents.

In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.

Title
Lithographic apparatus and device manufacturing method
Application Number
10/705785
Publication Number
7075616 (B2)
Application Date
November 12, 2003
Publication Date
July 11, 2006
Inventor
Bob Streefkerk
Tilburg
NL
Alexander Straaijer
Eindhoven
NL
Timotheus Franciscus Sengers
'S-Hertogenbosch
NL
Johannes Catharinus Hubertus Mulkens
Maastricht
NL
Jeroen Johannes Sophia Maria Mertens
Duizel
NL
Erik Roelof Loopstra
Heeze
NL
Joeri Lof
Eindhoven
NL
Christiaan Alexander Hoogendam
Veldhoven
NL
Sjoerd Nicolaas Lambertus Donders
'S-Hertogenbosch
NL
Antonius Theodorus Anna Maria Derksen
Eindhoven
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03B 27/52
G03B 27/42
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