07074543 is referenced by 90 patents and cites 26 patents.

There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

Title
Positive resist composition and method of forming resist pattern from the same
Application Number
10/467130
Publication Number
7074543 (B2)
Application Date
November 29, 2002
Publication Date
July 11, 2006
Inventor
Hideo Hada
Kawasaki
JP
Miwa Miyairi
Kawasaki
JP
Satoshi Fujimura
Kawasaki
JP
Naotaka Kubota
Kawasaki
JP
Takeshi Iwai
Kawasaki
JP
Agent
Dechert
Ben Bedi Esq
Assignee
Tokyo Ohka Kogyo
JP
IPC
G03F 7/30
G03F 7/004
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