07057190 is referenced by 27 patents and cites 17 patents.

A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the radiation can be transferred on debris present in the beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced. The foil trap may be alternately rotated around the optical axis in a first direction and a second direction opposite the first direction.

Title
Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured thereby
Application Number
11/381
Publication Number
7057190 (B2)
Application Date
December 1, 2004
Publication Date
June 6, 2006
Inventor
Vadim Yevgenyevich Banine
Helmond
NL
Frank Jeroen Pieter Schuurmans
Valkenswaard
NL
Levinus Pieter Bakker
Helmond
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NI
IPC
G03F 7/20
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