07010776 is referenced by 40 patents and cites 20 patents.

A method for calculating long-range image contributions from mask polygons. An algorithm is introduced having application to Optical Proximity Correction in optical lithography. A finite integral for each sector of a polygon replaces an infinite integral. Integrating over two triangles, rather than integrating on the full sector, achieves a finite integral. An analytical approach is presented for a power law kernel to reduce the numerical integration of a sector to an analytical expression evaluation. The mask polygon is divided into regions to calculate interaction effects, such as intermediate-range and long-range effects, by truncating the mask instead of truncating the kernel function.

Title
Extending the range of lithographic simulation integrals
Application Number
10/694466
Publication Number
7010776 (B2)
Application Date
October 27, 2003
Publication Date
March 7, 2006
Inventor
Shlomo Shlafman
Haifa
IL
Alan E Rosenbluth
Yorktown Heights
NY, US
Dov Ramm
Menashe
IL
Maharaj Mukherjee
Wappingers Falls
NY, US
Mark A Lavin
Katonah
NY, US
Kafai Lai
Poughkeepsie
NY, US
Emanuel Gofman
Haifa
IL
Gregg M Gallatin
Newtown
CT, US
Agent
Steven A Capella
Robert Curcio
DeLio & Peterson
Assignee
International Business Machines Corporation
NY, US
IPC
G06F 17/50
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