06998014 is referenced by 73 patents and cites 511 patents.

Embodiments of the present invention relate to an apparatus and method of plasma assisted deposition by generation of a plasma adjacent a processing region. One embodiment of the apparatus comprises a substrate processing chamber including a top shower plate, a power source coupled to the top shower plate, a bottom shower plate, and an insulator disposed between the top shower plate and the bottom shower plate. In one aspect, the power source is adapted to selectively provide power to the top shower plate to generate a plasma from the gases between the top shower plate and the bottom shower plate. In another embodiment, a power source is coupled to the top shower plate and the bottom shower plate to generate a plasma between the bottom shower plate and the substrate support. One embodiment of the method comprises performing in a single chamber one or more of the processes including, but not limited to, cyclical layer deposition, combined cyclical layer deposition and plasma-enhanced chemical vapor deposition; plasma-enhanced chemical vapor deposition; and/or chemical vapor deposition.

Title
Apparatus and method for plasma assisted deposition
Application Number
10/197940
Publication Number
6998014 (B2)
Application Date
July 16, 2002
Publication Date
February 14, 2006
Inventor
Mark M Hytros
Lake In The Hills
IL, US
Ming Xi
Milpitas
CA, US
Michael X Yang
Palo Alto
CA, US
Avgerinos Gelatos
Redwood City
CA, US
Chen An Chen
Milpitas
CA, US
Agent
Moser Patterson & Sheridan
Assignee
Applied Materials
CA, US
IPC
H01L 21/306
C23F 1/00
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