06978437 is referenced by 214 patents and cites 43 patents.

A photomask for eliminating antenna effects in an integrated circuit and integrated circuit manufactured with the photomask are disclosed. The photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may be formed using a mask pattern file created by analyzing a pattern in a mask layout file to identify a region including an antenna ratio less than a first design rule. A feature located in the identified region is moved based on a second design rule from a first position to a second position in the mask layout file to create a space in the identified region. A grounding feature is placed in the space and automatically connected to a gate feature in the mask layout file such that the antenna ratio is increased to greater than or approximately equal to the first design rule.

Title
Photomask for eliminating antenna effects in an integrated circuit and integrated circuit manufacture with same
Application Number
10/393687
Publication Number
6978437 (B1)
Application Date
March 20, 2003
Publication Date
December 20, 2005
Inventor
Micha Oren
Cupertino
CA, US
Danny Rittman
Sunnyvale
CA, US
Agent
Baker Botts L
Assignee
Toppan Photomasks
TX, US
IPC
H01L 023/485
H01L 021/00
H01L 021/82
H01L 021/8238
H01L 027/06
H01L 027/02
G03F 001/14
G21K 005/00
G06F 019/00
G06F 017/50
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