06969539 is referenced by 49 patents and cites 34 patents.

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris-(ter-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit hafnium silicate on surfaces heated to 300° C. The product film has a very uniform stoichiometry throughout the reactor. Similarly, vapors of diisopropylphosphate react with vapors of lithium bis(ethyldimethylsilyl)amide to deposit lithium phosphate films on substrates heated to 250° C. supplying the vapors in alternating pulse produces these same compositions with a very uniform distribution of thickness and excellent step coverage.

Title
Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
Application Number
10/381628
Publication Number
6969539 (B2)
Application Date
September 28, 2001
Publication Date
November 29, 2005
Inventor
Seigi Suh
Pleasanton
CA, US
Dennis Hausmann
Los Gatos
CA, US
Jill Becker
Cambridge
MA, US
Roy G Gordon
Cambridge
MA, US
Agent
Wilmer Cutler Pickering Hale and Dorr
Assignee
President and Fellows of Harvard College
MA, US
IPC
C23C 016/40
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