06893972 is referenced by 177 patents and cites 16 patents.

The novel process lends itself to the production of highly resolved resist structures. A resist structure having webs is produced from a photoresist on a substrate and then the sidewalls of the webs are selectively chemically amplified so that chemically amplified sidewall structures are obtained. After the removal of the chemically unamplified sections, the amplified sidewall structures are transferred to the substrate. The process permits a resolution of structures that are not producible using the currently customary exposure wavelengths.

Title
Process for sidewall amplification of resist structures and for the production of structures having reduced structure size
Application Number
10/233694
Publication Number
6893972 (B2)
Application Date
September 3, 2002
Publication Date
May 17, 2005
Inventor
Michael Sebald
Weisendorf
DE
Gertrud Falk
Erlangen
DE
Christoph Hohle
Bubenreuth
DE
Christian Eschbaumer
Schwaig
DE
Waltraud Herbst
Uttenreuth
DE
Eberhard Kühn
Hemhofen
DE
Jörg Rottstegge
Lilienthal
DE
Agent
Gregory L Mayback
Werner H Stemer
Laurence A Greenberg
Assignee
Infineon Technologies
DE
IPC
G03F 007/40
C03C 015/00
G03C 001/73
H01L 021/3065
H01L 021/302
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