06881523 is referenced by 93 patents and cites 26 patents.

A photolithography mask for optically transferring a pattern formed in said mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to be printed on the substrate, where each of the plurality of resolvable features has a longitudinal axis extending in a first direction; and a pair of non-resolvable optical proximity correction features disposed between two of the plurality of resolvable features, where the pair of non-resolvable optical proximity correction features has a longitudinal axis extending in a second direction, wherein the first direction of the longitudinal axis of the plurality of resolvable features is orthogonal to the second direction of the longitudinal axis of the pair of non-resolvable optical proximity correction features.

Title
Optical proximity correction method utilizing ruled ladder bars as sub-resolution assist features
Application Number
10/96536
Publication Number
6881523 (B2)
Application Date
March 13, 2002
Publication Date
April 19, 2005
Inventor
Bruce W Smith
Penfield
NY, US
Agent
McDermott Will & Emery
Assignee
ASML Masktools
NL
IPC
G03F 009/00
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