06867844 is referenced by 238 patents and cites 6 patents.

A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.

Title
Immersion photolithography system and method using microchannel nozzles
Application Number
10/464542
Publication Number
6867844 (B2)
Application Date
June 19, 2003
Publication Date
March 15, 2005
Inventor
Antonius Theodorus Anna Maria Derksen
Eindhoven
NL
Klaus Simon
Eindhoven
NL
Herman Vogel
Sandy Hook
CT, US
Agent
Sterne Kessler Goldstein & Fox P L L C
Assignee
ASML Holding
NL
IPC
G03B 027/54
G03B 027/52
View Original Source