06855475 is referenced by 3 patents and cites 25 patents.

Disclosed are photoresist compositions suitable for imaging with sub 200 nm wavelength radiation including as polymerized units one or more monomers having an electronegative substituent and an ester group containing certain leaving groups. Also disclosed are methods of providing photoresist relief images using the photoresist compositions.

Title
Photoresist composition
Application Number
10/101103
Publication Number
6855475 (B2)
Application Date
March 19, 2002
Publication Date
February 15, 2005
Inventor
Charles R Szmanda
Westborough
MA, US
Agent
Edwards & Angell
Darryl P Frickey
Peter F Corless
Assignee
Shipley Company L L C
MA, US
IPC
G03F 007/004
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