06855368 is referenced by 31 patents and cites 430 patents.

A method and system to reduce the resistance of refractory metal layers by controlling the presence of fluorine contained therein. The present invention is based upon the discovery that when employing ALD techniques to form refractory metal layers on a substrate, the carrier gas employed impacts the presence of fluorine in the resulting layer. As a result, the method features chemisorbing, onto the substrate, alternating monolayers of a first compound and a second compound, with the second compound having fluorine atoms associated therewith, with each of the first and second compounds being introduced into the processing chamber along with a carrier gas to control a quantity of the fluorine atoms associated with the monolayer of the second compound.

Title
Method and system for controlling the presence of fluorine in refractory metal layers
Application Number
9/625336
Publication Number
6855368 (B1)
Application Date
July 25, 2000
Publication Date
February 15, 2005
Inventor
Hua Chung
San Jose
CA, US
Lawrence Chung Lai Lei
Milpitas
CA, US
Jeong Soo Byun
Cupertino
CA, US
Alfred W Mak
Union City
CA, US
Moris Kori
Palo Alto
CA, US
Agent
Moser Patterson & Sheridan
Assignee
Applied Materials
CA, US
IPC
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