06790579 is referenced by 51 patents and cites 4 patents.

The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.

Title
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
Application Number
9/630894
Publication Number
6790579 (B1)
Application Date
August 2, 2000
Publication Date
September 14, 2004
Inventor
Larry F Rhodes
Silverlake
OH, US
Robert A Shick
Strongsville
OH, US
Saikumar Jayaraman
Cuyahoga Falls
OH, US
Brian L Goodall
Akron
OH, US
Agent
Hudak Shunk & Farine Co
US
Assignee
Sumitomo Bakelite
US
IPC
G03F 7/039
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