06781673 is referenced by 17 patents and cites 6 patents.

In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

Title
Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby
Application Number
9/934698
Publication Number
6781673 (B2)
Application Date
August 23, 2001
Publication Date
August 24, 2004
Inventor
Sjoerd Nicolaas Lambertus Donders
's-Hertogenbosch
US
Erik Roelof Loopstra
Heeze
US
Hans Meiling
Bilthoven
US
Erik Leonardus Ham
Rotterdam
US
Gerrit Jan Heerens
Schoonhoven
US
Hugo Matthieu Visser
Utrecht
US
Henri Gerard Cato Werij
Rotterdam
US
Martinus Hendrikus Antonius Leenders
Rotterdam
US
Vadim Yevgenyevich Banine
Helmond
US
Johannes Hubertus Josephina Moors
Helmond
US
Agent
Pillsbury Winthrop
US
Assignee
ASML Netherlands
US
IPC
G03B 27/62
View Original Source