06743563 is referenced by 3 patents.

Resists of the invention contain an added acid component which has been found can significantly enhance stability during storage between manufacture and use. Preferred resists of the invention contain an ester-based solvent such as ethyl lactate or propylene glycol methyl ether acetate in addition to the acid component.

Title
Photoresist compositions
Application Number
9/930880
Publication Number
6743563 (B2)
Application Date
August 15, 2001
Publication Date
June 1, 2004
Inventor
Sheri L Ablaza
Stow
MA, US
James F Cameron
Cambridge
MA, US
Agent
Edwards & Angell
US
Agent
Darryl P Frickey
US
Peter F Corless
US
Assignee
Shipley Company L L C
MA, US
IPC
G03F 7/004
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