06678037 is referenced by 15 patents.

In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.

Title
Lithographic apparatus, device manufacturing method, and device manufactured thereby
Application Number
9/971769
Publication Number
6678037 (B2)
Application Date
October 9, 2001
Publication Date
January 13, 2004
Inventor
Levinus Pieter Bakker
Eindhoven
US
Hugo Matthieu Visser
Utrecht
US
Vadim Yevgenyevich Banine
Helmond
US
Martinus Hendrikus Antonius Leenders
Rotterdam
US
Jan Van Elp
Delft
US
Agent
Pillsbury Winthrop
US
Assignee
ASML Netherlands
US
IPC
G03B 27/54
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