06653027 is referenced by 5 patents and cites 4 patents.

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen or metal, silicon, nitrogen and oxygen. A wide range of optical transmission (0.001% up to 20% at 193 nm) is obtained by this process. A post deposition process is implemented to obtain the desired properties (stability of optical properties with respect to laser irradiation and acid treatment) for use in industry. A special fabrication process for the sputter target is implemented to lower the defects of the film.

Title
Attenuated embedded phase shift photomask blanks
Application Number
9/793646
Publication Number
6653027 (B2)
Application Date
February 26, 2001
Publication Date
November 25, 2003
Inventor
Kenneth Christopher Racette
Fairfax
VT, US
Michael Straight Hibbs
Westford
VT, US
C Richard Guarnieri
Somers
NY, US
S Jay Chey
Ossining
NY, US
Cameron James Brooks
Elmsford
NY, US
Katherina E Babich
Chappaqua
NY, US
Marie Angelopoulos
Cortlandt Manor
NY, US
Agent
Daniel P Morris
US
Assignee
International Business Machines Corporation
NY, US
IPC
G03F 9/00
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