06584609 is referenced by 41 patents and cites 9 patents.

A semiconductor layout testing and correction system is disclosed. The system combines both rule-based optical proximity correction and model-based optical proximity correction in order to test and correct semiconductor layouts. In a first embodiment, a semiconductor layout is first processed by a rule-based optical proximity correction system and then subsequently processed by a model-based optical proximity correction system. In another embodiment, the system first processes a semiconductor layout with a rule-based optical proximity correction system and then selectively processes difficult features using a model-based optical proximity correction system. In yet another embodiment, the system selectively processes the various features of a semiconductor layout using a rule-based optical proximity correction system or a model-based optical proximity correction system.

Title
Method and apparatus for mixed-mode optical proximity correction
Application Number
9/514551
Publication Number
6584609 (B1)
Application Date
February 28, 2000
Publication Date
June 24, 2003
Inventor
Yao Ting Wang
Sunnyvale
CA, US
Hoyong Park
Sunnyvale
CA, US
Fang Cheng Chang
Sunnyvale
CA, US
You Ping Zhang
Newark
CA, US
Christophe Pierrat
Santa Clara
CA, US
Assignee
Numerical Technologies
CA, US
IPC
G06F 17/50
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